Products and Solutions

PV Cell Manufacturing Automation Equipment

Vertical PVD System with U Turn

Features

Vertical sputtering with U turn, footprint reduction;
2800 mm in length, planar cathode;
Intelligent program management, real-time data recording.

Performance

  • Substrate: 1200mm*2400mm*2.2~3.2mm;
  • Tact time: 35s;
  • Process speed: 40mm/s;
  • Breakage rate<0.1%;
  • Grip area <5mm;
  • Between/Within uniformity<5%。

 

Parameter

Layout: 43700mm*11480mm*5200mm (Automation included)

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