Products and Solutions

PV Cell Manufacturing Automation Equipment

TBC Acid Polishing Chain Cleaning Equipment

Features introduction

Dual-groove design, fast switching, significantly reducing the liquid change time;
Accurate liquid roller, stable liquid dosage;
Multiple parallel water washes, ensure cleaning effectiveness while improving the utilization rate of pure water.

Technical performance

  • Capacity: ≥12000 wafer/h, 182
  • Transmission speed: 1.0-4.0 m/min
  • Operating speed: 4.0m/min
  • Breakage rate: <0.5‰
  • Uptime: ≥98%

 

Parameter

Cleaning process: Water film→PSG Clean→ Water bleached acid etching→ Rinse → Alkali wash→ Rinse → DHF → Rinse →DRY

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