Stock Code: 000821

Products and Solutions

PV Cell Manufacturing Automation Equipment

HTL/Conductive Layer PVD Coating Equipment

Features introduction

Vertical sputtering with U turn, footprint reduction;
Intelligent program management, real-time data recording;
Adapted to the large-area glass substrate linear production lines.

Technical performance

Up time: ≥92%
Tact time: 60s
Target material utilization rate: ≥30%(wt%)/≥80%(wt%)
Breakage rate: 0.1%
Between/Within uniformity: ＜5%@EE=10mm
Substrate: 1200mm(L)*600mm(W)*1.6mm~3.2mm

Parameter

Layout dimension: 23000mm*5100mm*3500mm (Automation include)

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