Products and Solutions

PV Cell Manufacturing Automation Equipment

HJT Wafer Tube Cleaning Equipment -MW level

Features

Drying system, combination of external circulating intake and active exhaust;
Atmospheric mixed ozone washing, ensure mixing effectiveness
Cold/hot water slow lift process, wider process window;
Combining efficient filtration with preliminary filtration, ensure higher cleanliness inside the device.

Performance

  • Equipment capacity >19200Pcs/h(232pcs half cell per basket)(800MW@210B、600MW@182B)
  • Breakage rate< 0.3‰;
  • Reflectivity> 40%, texture uniformity<1%,texture uniformity between cell<1%;
  • Step width greater than 15um ;
  • Uptime: ≥97%;
  • Ozone concentration > 40 ppm ;
  • Product yield >99.9%

 

Parameter

Cleaning process: O3-Clean→SDE→O3-Clean→DHF→DRY

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