Features
Distributed coil &V type runner plate forms a high-efficiency liquid distribution system;
Stable and excellent liquid uniformity and temperature field;
Small flow bubbling technology, uniform bubbling to ensure an effective cleaning outcome;
Arm dispatch system, Achieve flexible production;
Internal circulation and active dehumidification drying chamber, efficient drying of Si wafers while saving energy and reducing emissions;
Drying equipped with chemical filter , ensure O3 gas concentration < 10ppb.
Performance
Parameter
Cleaning process: O3-Clean→SDE→PreCln→TEX→Post1→CP ( →Post2)→DHF→DRY