Products and Solutions

PV Cell Manufacturing Automation Equipment

HJT Texturing Cleaning Equipment-GW level

Features

Distributed coil &V type runner plate forms a high-efficiency liquid distribution system;
Stable and excellent liquid uniformity and temperature field;
Small flow bubbling technology, uniform bubbling to ensure an effective cleaning outcome;
Arm dispatch system, Achieve flexible production;
Internal circulation and active dehumidification drying chamber, efficient drying of Si wafers while saving energy and reducing emissions;
Drying equipped with chemical filter , ensure O3 gas concentration < 10ppb.

Performance

  • Capacity >32000Pcs/h(232pcs half cell per basket)(1.2GW@210B、1GW@182B)
  • Breakage rate< 0.3‰;
  • Reflectivity< 11%, texture uniformity<1%,texture uniformity between cell<1%;
  • Yield rate ≥99.8%(except the problem of raw materials);
  • >75% of the texture is within the target pyramid, as 0.8-3um 、2-5um 、5-8um;
  • Uptime: ≥ 92%;
  • ozone concentration >50ppm.

 

Parameter

Cleaning process: O3-Clean→SDE→PreCln→TEX→Post1→CP ( →Post2)→DHF→DRY

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